There are new details on the manufacturing process used by Nvidia's RTX-3000 GPUs (amps) and the successor RTX 4000 (Hopper). This emerges from a leak of the Taiwanese DigiTimes (Paywall, via Wccftech).
So far, it was only known about the RTX-3000 generation that it should be produced in 7 nanometers and maybe even by extreme ultraviolet process (EUV). On the one hand at Samsung, on the other hand at the long-term partner TSMC.
The new information about Nvidia Ampere and Hopper
DigiTimes, which is considered an industry-related and reliable source, claims to have found out that Nvidia actually does the RTX-3000 series at TSMC using the 7nm EUV procedure can be made.
But, according to the latest information, possibly only the mid- to high-end models from an assumed RTX 3070. Mid-to low-end models up to an assumed RTX 3060 could be with Samsung in their 7nm or 8nm EUV- Process.
more on the subject
Nvidia RTX 3000 Amp Release & Specs
This is not set in stone yet, but in view of the competitive situation with AMD it could well happen.
Is AMD blocking the necessary capacities? In this context, the DigiTimes report shows that Nvidia may have overlooked securing sufficient production capacity at TSMC in good time. At the same time, AMD's ambitious approach had been underestimated, leaving production capacities to the competition.
RTX 4000 hopper
So that a similar problem does not repeat itself in the case of the Ampere successor with the presumed name Hopper, Nvidia should have booked 5nm capacities for 2021 with TSMC early on, according to Wccftech.
It should also be an EUV procedure. Smaller quantities could also be omitted in the case of Hopper or the RTX 4000 generation on Samsung's production lines, according to the report.
What does the EUV procedure bring?
In contrast to the previous method, which is also called 193 nm lithography due to the wavelength used, electromagnetic waves with a length of 13.5 nm are used for EUV lithography. This makes it possible Show structures significantly smaller as before.
In addition to the microarchitecture such as Ampere or Hopper, the reduction in the structure width or the manufacturing process used is responsible for the improvement of performance and efficiency in graphics cards.